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Metallic gratings were fabricated using high energy laser interferencelithography with a frequency tripled Nd:YAG nanosecond laser. The gratingstructures were first recorded in a photosensitive layer and afterwardstransferred to an Au film. High quality Au gratings with a period of 770 nm andpeak-to-valley heights of 20-60 nm exhibiting plasmonic resonance response weresuccessfully designed, fabricated and characterized.

Fabrication of high quality sub-micron Au gratings over large areas with pulsed laser interference lithography for SPR sensors