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A method to fabricate GaAs microcavities using only a soft mask with anelectrolithographic pattern in an inductively coupled plasma etching ispresented. A careful characterization of the fabrication process pinpointingthe main routes for a smooth device sidewall is discussed. Using the finalrecipe, optomechanical microdisk resonators are fabricated. The results show avery high optical quality factors of $Q_\text{opt}>2\times 10^{5}$, among thelargest already reported for dry-etching devices. The final devices are alsoshown to present high mechanical quality factors and an optomechanical vacuumcoupling constant of $g_{0}=2\pi\times 13.6$ kHz enabling self-sustainablemechanical oscillations for an optical input power above $1$ mW.

Ar/Cl$_{2}$ etching of GaAs optomechanical microdisks fabricated with positive electroresist