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In this letter, we study a nonlinear interferometric setup based ondiffraction rather than beam combining. It consists of a nonlinear analogue ofYoung's double-slit experiment where a nonlinear material is placed exactlyafter one of the slits. The presence of nonlinearity breaks the transversespatial symmetry of the system and thus modifies the optical path. For moderatenonlinearities this leads to a self-induced shift of the intensity pattern inthe transverse plane. A simple theoretical model is developed which issurprisingly accurate in predicting the intensity profile of the main lobes fora wide range of parameters. We discuss about possible applications of our modelin nonlinear interferometry, for example in measuring the nonlinearities ofoptical materials.

Modifying the optical path in a nonlinear double-slit experiment