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Quill effect, one of the intriguing phenomena in ultrafast laser writing, toour knowledge, has not been studied in low-loss-waveguide (LLW) writing regimeyet, probably due to its invisibility under conventional white-light microscopein that regime. In this report, with help of adaptive third harmonic generationmicroscopy we reveal the quill effect in LLW writing regime and study itsinfluences on the properties of written photonic integrated components in termof polarization-related properties in fused silica and beam-splitting ratio ofthree-waveguide-coupler in borosilicate glass.

Ultrafast laser writing quill effect in low loss waveguide fabrication regime