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We present a method to demonstrate Anderson localization in an opticallyinduced randomized potential. By usage of computer controlled spatial lightmodulators, we are able to implement fully randomized nondiffracting beams ofvariable structural size in order to control the modulation length (photonicgrain size) as well as the depth (disorder strength) of a random potentialinduced in a photorefractive crystal. In particular, we quantitatively analyzethe localization length of light depending on these two parameters and findthat they are crucial influencing factors on the propagation behavior leadingto variably strong localization. Thus, we corroborate that transverse lightlocalization in a random refractive index landscape strongly depends on thecharacter of the potential, allowing for a flexible regulation of thelocalization strength by adapting the optical induction configuration.

Analysis of transverse Anderson localization in refractive index structures with customized random potential