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An understanding of the photochemical and photo-physical processes, which occur during photopolymerization is of extreme importance when attempting to improve a photopolymer material's performance for a given application. Recent work carried out on the modelling of the mechanisms which occur in photopolymers during- and post-exposure, has led to the development of a tool, which can be used to predict the behaviour of these materials under a wide range of conditions. In this paper, we explore this Non-local Photo-polymerisation Driven Diffusion model, illustrating some of the useful trends, which the model predicts and we analyse their implications on the improvement of photopolymer material performance.

Optimisation of photopolymers for holographic applications using the Non-local Photo-polymerization Driven Diffusion model