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Mechanism of Undulating Wear Formation of Overhead Rigid Conductor Line Related to Dynamic Characteristics of Pantographs Tatsuya KOYAMA and Mitsuo ABOSHI *1 Railway Technical Research Institute Hikari-cho 2-8-38, Kokubunji-shi, Tokyo, 185-8540 Japan When there is an undulating wear on overhead rigid conductor line, arc due to contact loss is generated between the conductor line and a pantograph. The arcs cause extreme wear of contact lines and contact strips of the pantograph. However the mechanism of the undulating wear formation has not been clarified. This paper to make clear the mechanism of the formation of the undulating wear through on-site investigation of overhead rigid conductor lines and excitation tests of the pantograph. It was been clarified that the dynamic characteristics of pantograph and the distance between pantograph heads play a causal role in the undulating wear formation. Firstly, a periodic unevenness is generated by mechanical wear that is caused due to the dynamic characteristics of pantograph, especially anti-resonance phenomenon of pantograph. When the wear amplitude of unevenness grows to the extent with which pantographs cannot comply, arc due to contact loss occurs between overhead rigid conduct line and the pantograph. By this arc, electric wear is generated in a hollow of unevenness, then the undulating wear of which wavelength is related to the interval of pantograph head grows.