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In order to obtain some useful information on rapid process for functional film deposition, TiO2 film deposition by thermal plasma chemical vapor deposition (TPCVD) method under an atmospheric environment were carried out. The experiment was conducted on the condition that working gas was Ar, working gas flow rate was 20L/min, the spraying distance was varied from 10 to 60mm and spraying time was 5 min. As feedstock material, titanium tetrabutoxide was used. According to the XRD charts, the TiO2 films formed by TPCVD contained peaks of rutile-type and anatase-type. Beside, from the results of wettability test and methylene blue decoloration test, it was proved that the TiO2 films had high photocatalytic properties and the properties of the samples came to be high as the spraying distance during deposition became short. From these results, this process was thought to have high potential for rapid functional film process.

Rapid Synthesis of Photocatalytic Titanium Oxide Film by Atmospheric TPCVD