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The surface of NiTi shape memory was modified by deposition of chitosan‐ZnO thin film. The electrodeposition process was carried out at room temperature at voltage-time conditions: 10 V/30 s, 10 V/300 s, 20 V/30 s, or 20 V/300 s. Structure of the obtained coatings was studied by means of grazing incidence beam X-ray diraction. Distribution of the zinc oxide particles in the chitosan matrix was observed with use of scanning electron microscopy. It was found that depending on the electrodeposition parameters, the structure of the obtained chitosan‐ZnO coatings varies from amorphous to coarse-grained.

Structure of Chitosan-ZnO Layers Electrophoretically Deposited on NiTi Shape Memory Alloy