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This study proposes the unique method to analyze the cleanliness of the fine metal mask (FMM) used in OLED display manufacturing after FMM cleaning process. We developed a FMM-mimic microstructure as a substitute for the FMM, which can be used for the evaluation of cleaning efficiency. The FMM-mimic microstructure was fabricated using a combination of photolithography, reactive ion etching, anodic bonding and sand blasting processes. To demonstrate the proposed cleanliness analytical method, a 1.4 μm-thick Tris-(8-hydroxyquinoline) aluminum (Alq3) film was deposited on the FMM-mimic microstructure as a contaminant by vacuum thermal evaporation. The Alq3-deposited FMM-mimic microstructure was cleaned by N-methyl-2-pyrrolidone (NMP) with changing cleaning time. We analyzed the residual contaminants on the FMM-mimic microstructure using a fluorescence microscope. The developed FMM-mimic microstructure proves very convenient for inspecting the residual contaminant inside the gap through the transparent glass by general optical and fluorescence microscopy.

Microstructure-based analysis of fine metal mask cleaning in organic light emitting diode display manufacturing