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As three-dimensional (3D) nanostructures can significantly improve the absorption capacity of photons, it is widely used in various photovoltaic devices. However, the high-cost and complex preparation process of traditional 3D nanostructures restricted its development greatly. In this paper, a new type of nanocone cluster microstructure was prepared on polydimethylsiloxane (PDMS) substrate by using a simple template process. This novel nanocone cluster microstructure can significantly improve the light transmittance and reduce the light reflection, showing superior anti-reflection property. In the whole range of visible band, the nanocone cluster microstructure effectively reduces the reflectivity of the light, so that it remains below 3.5%. In addition, this kind of cluster microstructure showed excellent superhydrophobic property and self-cleaning ability with the contact angle of 151°.

A Novel Nanocone Cluster Microstructure with Anti-reflection and Superhydrophobic Properties for Photovoltaic Devices