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This paper concern the calculation of equilibrium composition of plasma mixture Air-Water vapor and copper vapor in temperatures range 1000K to 20000 K. The plasma is suposed to be in local thermodynamic equilibrium. We used Gibbs free energy minimization method to access the different numerical densities of chemical species as a function of temperature. This data are very important to calculate thermodynamic properties, transport coefficients and modeling electrical arc in circuit breakers. The result shows that the influence of metallic copper vapor is important on equilibrium composition of plasma. In particular the densities of electron in the plasma increase with the percentage of copper vapor for the temperature inferior to 17000K. The increasing of electron densities increase electrical conductivity of plasma and limit the performance of circuit breakers. Also the electrical neutrality is made mainly between electron (e-) and Cu+ in low temperature (T < 12000K). We are studying in particular the evolution of the densities of the main chemical species created in this plasma as a function of pressure. We choose four values of pressure (1 atm, 5 atm, 10 atm and 15 atm). The results obtained shows an increasing of chemical densities with the pressure in the mixture in conformity at Dalton's Law. the increasing of the pressure in the plasma retard chemical reactions because it disadvantages the dislocations that constitute dissociation and ionization reactions in the plasma.

american journal of nano research and applications

Influence of Metallic Copper Vapors on the Chemical Composition of a Mixture of Air and Water Vapor Thermal Plasmas in the Temperature Range 1000 K to 20000K