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The goal of the present work was the modeling of MOS solar cells operating in an inversion regime controlled by positively charged centers at the SiNxOy interface. This type of solar cell was recently manufactured for the first time in the activities developed in the group of Surfaces, Interfaces and Electrochemical Deposition (GSIDE) from LSI/PSI/EPUSP using ultra-thin gate dielectrics (~2nm). The recipe for the growth of ultra-thin dielectrics was developed to ensure reproducibility and uniformity of the dielectrics thickness over large areas of few square centimeters. Based on the experimental curves CxVg, GxVg e IxVg of the manufactured MOS solar cells, it was shown for cells manufactured in P-type substrate that there are K centers dominantly filled with positive charges in all operating regimes (accumulation, depletion and inversion). The positive charge density (Qiq) at the SiNxOy/Si interface, in addition to having a positive charge, presented a linear behaviour with the surface potential (ψs) or with the gate voltage (Vg) according to the results obtained from a numerical simulator developed for this application. Such behavior consisted of accommodating the positive charges at the SiNxOy/Si interface so that a deep depletion region (Wd) is formed without the presence of the inversion layer in the condition without illumination. For MOS cells subjected to different levels of illumination, both for dielectrics grown at 850C as well as for those grown at 700C, it was found that the K centers at the SiNxOy/Si interface work as a region of positive charge storage as the electrons tunnel from the interface towards the metal gate of the MOS cells. As a result, this type of behaviour means a new way of implementing the photovoltaic effect.

Modelagem de células solares nMOS operando em regime de inversão induzido por cargas positivas na interface SiOxNy/Si.