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In this work, we present a new fabrication process to obtain V-grooves on monocrystaline silicon substrates (100) for optical coupling using nickel silicides as mask material. The nickel silicide film 10 nm thick for 200 nm of nickel thick) was obtained using thermal evaporation and annealing processes at low temperatures (200 and 250°C) as mask for alkaline solutions. Vgrooves (60 μm deep) were fabricated by anisotropic etching process, using a KOH (27%-60°) solution. During this process, the etch rate of the silicon substrate by the KOH solution was measured as 33.1 μm/h. The composition of the obtained nickel silicide layer was investigated using RBS technique, which supplied us the stoichiometric Ni2Si. The roughness of nickel and Ni2Si layers was measured by AFM technique. A SEM analysis was made with the obtained Vgrooves and waveguides.. After processing the V-grooves, they were aligned with a simple waveguide for a future optical coupling.

Fabricação de canaletas em substratos de silício para acoplamento fibra-guia utilizando siliceto de níquel como material de máscara.