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The micro/nanostructure of manganese silicide (Mn-Si) compounds with various morphologies (nanowires, films, particles, and polyhedron shape structure) has been synthesized through oxygen assisted chemical vapor deposition by changing the stacking geometry of manganese powder. Polyhedrons prepared in the Mn-Si contact area were identified to be chemical composition gradient functionally graded materials which were verified by analyzing atomic ratio of Mn/Si from top to bottom. Evolution of morphology greatly depended on the stacking shape correlated distance from precursor to the substrate, resulting in distinctive growth mechanisms. Main structures on the substrate have been verified to be Mn5Si3 and Mn4Si7 with different Mn stacking in bumps comparing to sole Mn4Si7 with flat surface.

Morphology Evolution of Mn-Si Composition Gradient Micro/Nanomaterials Prepared by Oxygen Assisted Chemical Vapor Deposition