Open Access(Invited) Metal Gate/High-κ Dielectric Gate Stack Reliability; or How I Learned to Live with Trappy Oxides
Author(s) -
B.P. Linder,
E. Cartier,
Siddarth Krishnan
Publication year - 2013
Publication title -
ecs meeting abstracts
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2013-01/20/868
Subject(s) - stack (abstract data type) , reliability (semiconductor) , gate dielectric , metal gate , materials science , dielectric , high κ dielectric , optoelectronics , electrical engineering , gate oxide , computer science , electronic engineering , reliability engineering , engineering physics , engineering , physics , transistor , operating system , voltage , quantum mechanics , power (physics)
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