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New binary and ternary compounds of the light elements boron, carbon, and nitrogen were predicted to have extraordinary properties, as hard coatings or dielectric materials. Films of BCxNy were produced in a chemical vapour deposition (LPCVD, PECVD) process using trimethylamine borane (TMAB), triethylamine borane (TEAB) or trimethylborazine (TMB) as precursor and with H2, He, N2, and NH3, respectively, as auxiliary gas. The produced films deposited on Si(100) wafers were some 100 nm thick and were characterized chemically and physically. The chemical bond character was determined by X-ray photoelectron spectroscopy (XPS) (e.g., Fig. 1), synchrotron radiation-based total reflection X-ray fluorescence analysis (TXRF-NEXAFS) (e.g., Fig. 2), and by Fourier transformed infrared spectroscopy (FTIR) (e.g., Fig. 3).

Analytical Characterization of BCxNy Films Grown with Trimethylamine Borane, Triethylamine Borane or Trimethylborazine Precursor