Open AccessThe Electrical Properties of Low Temperature Poly-Si Thin Film Transistor using Ni-ALD Process
Author(s) -
Seung Min Lee,
Choong Hee Lee,
Tae Hun Jung,
Hyun Jae Kim
Publication year - 2008
Publication title -
ecs meeting abstracts
Language(s) - English
Resource type - Journals
eISSN - 2151-2035
pISSN - 1091-8213
DOI - 10.1149/ma2008-01/16/661
Subject(s) - materials science , thin film transistor , transistor , optoelectronics , process (computing) , nanotechnology , electrical engineering , computer science , voltage , engineering , layer (electronics) , operating system
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