English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Global: Zendy Plus annual

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Global: Zendy Plus monthly

Global: Zendy Tools annual

Global: Zendy Tools monthly

Global: Zendy Free Plan

The giant magnetoresistance (GMR) was investigated for electrodeposited Co/Cumultilayers. In order to better understand the formation of individual layersand their influence on GMR, multilayers produced by two different depositionstrategies were compared. One series of Co(2 nm)/Cu(tCu) multilayers with tCuranging from 0.5 nm to 6 nm was produced with the conventional two-pulseplating by using a galvanostatic/potentiostatic (G/P) pulse combination for themagnetic/non-magnetic layer deposition, respectively, whereby the Cu layerdeposition was carried out at the electrochemically optimized potential.Another Co(2 nm)/Cu(tCu) multilayer series with the same tCu range was preparedwith the help of a G/P/G pulse combination. In this latter case, first abilayer of Co(2 nm)/Cu(6 nm) was deposited in each cycle as in the G/P modeafter which a third G pulse was applied with a small anodic current to dissolvepart of the 6 nm thick Cu layer in order to ensure the targeted tCu value. Thecomparison of the two series revealed that the G/P/G pulse combination yieldsmultilayers for which GMR can be obtained even at such low nominal Cu layerthicknesses where G/P multilayers already exhibit bulk-like anisotropicmagnetoresistance only. Surface roughness measurements by atomic forcemicroscopy revealed that the two kinds of pulse combination yield differentsurface roughness values which correlate with the structural quality of themultilayers as indicated by the absence or presence of multilayer satellitereflections in the X-ray diffraction patterns. The results of multilayerchemical analysis revealed that mainly an increased Cu content of the magneticlayer is responsible for the onset of SPM regions in the form of Cosegregations in the G/P/G multilayers with small Cu layer thicknesses.

Structure and Giant Magnetoresistance of Electrodeposited Co/Cu Multilayers Prepared by Two-Pulse (G/P) and Three-Pulse (G/P/G) Plating