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A practical nanofabrication process is detailed here for the generation of black GaAs. Discontinuous thin films of Au nanoparticles are electrodeposited onto GaAs substrates to catalyze site-specific etching in a solution of KMnO 4 and HF according to the metal-assisted chemical etching mechanism. This provides a solution-based and lithography-free method for fabricating sub-wavelength nanostructure arrays that exhibit solar-weighted reflectance approaching 4 %. This two-step benchtop process can be entirely performed at room-temperature without lithographic patterning or vacuum instrumentation, providing an alternative high-throughput nanotexturing approach for thin-film photovoltaics applications.

Communication—Black GaAs with Sub-Wavelength Nanostructures Fabricated via Lithography-Free Metal-Assisted Chemical Etching