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Photolithography is a process in the production of integrated circuits inwhich a mask is used to create an exposed pattern with a desired geometricshape. In the inverse problem of photolithography, a desired pattern is givenand the mask that produces an exposed pattern which is close to the desired oneis sought. We propose a variational approach formulation of this shape designproblem and introduce a regularization strategy. The main novelty in this workis the regularization term that makes the thresholding operation involved inphotolithography stable. The potential of the method is demonstrated innumerical experiments.

A variational approach to the inverse photolithography problem