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Optical systems for extreme ultraviolet (EUV) wavelengths can now reach diffraction-limited quality due to advances in optical fabrication, coating, and testing at accuracies measured in tenths of a nanometer. Driven by the demands of semiconductor photolithography, these ultrahigh-accuracy interferometric testing methods, which measure EUV optics at their operational wavelengths, produce some of the highest resolution optical systems ever made.

Testing EUV optics with EUV light: If you can measure it, you can make it