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Rigorous computer simulations of propagating electromagnetic fields havebecome an important tool for optical metrology and design of nanostructuredoptical components. A vectorial finite element method (FEM) is a good choicefor an accurate modeling of complicated geometrical features. However, from anumerical point of view solving the arising system of linear equations is verydemanding even for medium sized 3D domains. In numerics, a domain decompositionmethod is a commonly used strategy to overcome this problem. Within thisapproach the overall computational domain is split up into smaller domains andinterface conditions are used to assure continuity of the electromagneticfield. Unfortunately, standard implementations of the domain decompositionmethod as developed for electrostatic problems are not appropriate for wavepropagation problems. In an earlier paper we therefore proposed a domaindecomposition method adapted to electromagnetic field wave propagationproblems. In this paper we apply this method to 3D mask simulation.

A Rigorous Finite-Element Domain Decomposition Method for Electromagnetic Near Field Simulations