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We present rigorous 3D EMF simulations of isolated features on photomasksusing a newly developed finite-element method. We report on the current statusof the finite-element solver JCMsuite, incorporating higher-order edgeelements, adaptive refinement methods, and fast solution algorithms. Wedemonstrate that rigorous and accurate results on light scattering off isolatedfeatures can be achived at relatively low computational cost, compared to thestandard approach of simulations on large-pitch, periodic computationaldomains.

Electromagnetic Field Simulations of Isolated and Periodic 3D Photomask Patterns