English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Zendy Plus

Presents the access of premium content as premium feature

Premium Content

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the summarisation as premium feature

Summarisation

Insights

Presents the pdf analysis as premium feature

PDF Analysis

Presents the zaia usage as premium feature

ZAIA

Zendy Tools

Zendy Open

This paper will discuss and show applications of optical emission spectroscopy techniques and methods to monitor plasma emissions during semiconductor processing. A brief discussion of the instrumentation that was used and the software to control the instrumentation will also be presented. Optical emission spectroscopy techniques that will be discussed include chemical species identification in plasma etching, process fingerprinting, contamination detection, endpoint analysis/control and sputter/deposition plasma monitoring.

<title>Application of optical emission diagnostics and control related to semiconductor processing</title>