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RESCAN is a coherent diffraction imaging based APMI microscope prototype. A complex image of the EUV reticle is reconstructed from diffraction patterns collected on a CCD detector. With the next upgrade of the tool, the resolution will be enhanced from the current 34 nm down to 20 nm on mask. Also the illumination NA value will change from the current range of 0.002 to 0.02 to a value of 0.035. Here, we study how a change of the illumination NA affects the EUV mask inspection in simulation. We observe a better image quality, lower object error and higher defect sensitivity with increasing illumination NA.

Effects of the illumination NA on EUV mask inspection with coherent diffraction imaging