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Applying freeform optics in high-end optical systems can improve system performance while decreasing the system mass, size and number of required components. Their widespread application is however held back by the lack of a suitable metrology method. TNO, TU/e and NMi VSL have therefore developed the NANOMEFOS measurement machine [1], capable of universal non-contact and fast measurement of aspherical and freeform optics ranging from convex to concave and from flat to freeform, up to ⊘500 mm, with an uncertainty below 30 nm (2σ).

NANOMEFOS non-contact measurement machine for aspheric and freeform optics