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. This guest editorial summarizes the Special Section on Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects

journal of micro/nanolithography, mems, and moems

Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 3: Pattern Roughness, Local Uniformity, and Stochastic Defects