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A dielectric columnar thin film (CTF), characterized macroscopically by arelative permittivity dyadic, was investigated theoretically with theassumption that, on the nanoscale, it is an assembly of parallel, identical,elongated ellipsoidal inclusions made of an isotropic dielectric material thathas a different refractive index from the bulk material that was evaporated tofabricate the CTF. The inverse Bruggeman homogenization formalism was developedin order to estimate the refractive index of the deposited material, one of thetwo shape factors of the ellipsoidal inclusions, and the volume fractionoccupied by the deposited material, from a knowledge of relative permittivitydyadic of the CTF. A modified Newton--Raphson technique was implemented tosolve the inverse Bruggeman equations. Numerical studies revealed how the threenanoscale parameters of CTFs vary as functions of the vapour incidence angle.

Determination of constitutive and morphological parameters of columnar thin films by inverse homogenization