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The fabrication of oxide electronics devices is presently hindered by thelack of standardized and well established patterning procedures, applicabledown to the nanoscale. In this work, the authors propose a procedure to obtainpatterns with resolution around 100 nm on (La,Sr)MnO3/LaAlO3/SrTiO3heterostructures. Our method is based on a multistep technique, which includeswet and dry etching, epitaxial masking, and e-beam lithography. Our procedureis devised to define independent patterns on the interfacial two dimensionalelectron gas and on the metallic top electrode, while preserving an all-in situapproach for the heterostructure growth. The authors show results on nano-scaledevices based on (La,Sr)MnO3/LaAlO3/SrTiO3, suitable for oxide spintronicsapplications.

journal of vacuum science and technology. b, nanotechnology and microelectronics

Nanopatterning process based on epitaxial masking for the fabrication of  electronic and spintronic devices made of La0.67Sr0.33MnO3/LaAlO3/SrTiO3  heterostructures with in situ interfaces