English (United Kingdom)

https://curated-unify.zendy.io/wp-json/zendy-region/v1/featured_content/oa?rat=en

https://curated-unify.zendy.io/wp-json/zendy-region/v1/highlighted_journal/

Zendy Open

Presents the pdf analysis as premium feature

PDF Analysis

Insights

Presents the summarisation as premium feature

Summarisation

Presents the keyphrase highlighting as premium feature

Keyphrase Highlighting

Presents the zaia usage as premium feature

ZAIA

Zendy Tools

Zendy Plus

Presents the access of premium content as premium feature

Premium Content

We have developed an inductively coupled plasma etching process for fabrication of high-aspect-ratio hole-type photonic crystals in InP, which are of interest for optical devices involving the telecommunication wavelength of 1550nm. The etching was performed at 250°C using Cl2∕O2 chemistry for sidewall passivation. The process yields nearly cylindrical features with an aspect ratio larger than 10 for hole diameters near 0.25μm. This makes them very suitable for high-quality photonic crystal patterns.

Cl 2 ∕ O 2 -inductively coupled plasma etching of deep hole-type photonic crystals in InP