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Defocus detection technology is the key technology in the fields of laser direct writing, optical disc storage, and high-precision lithography, which directly affects the accuracy of line drawing. In this paper, using the principle of astigmatic method, combined with differential technology, a nano-level defocus detection method based on differential astigmatism for the high numerical aperture systems is proposed. Firstly, by establishing a mathematical model, the theoretical analysis and simulation of the defocus detection method based on differential astigmatism are carried out. In addition, the system parameters at the maximum sensitivity of the high numerical aperture defocus detection system is also solved. Secondly, the defocus detection experimental system based on astigmatic method was built for experimental demonstration. Finally, using the objective lens with a numerical aperture of 0.8, the focus error signal curve with a good linear relationship is obtained in this paper. The linear range is 6&#x03BC;m; the system sensitivity can reach 5 nm; the system detection accuracy is 30 nm, and the repeat positioning accuracy can reach 30 nm. The defocus detection method based on the high numerical aperture objective lens has the advantages of large detection range, high detection accuracy and compact system structure, which can be widely used in various new high-precision laser processing fields.

Focal Surface Detection of High Numerical Aperture Objective Lens Based on Differential Astigmatic Method