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The demonstration of enhanced spatial control of nanosecond microwave plasmas generated by the time reversal plasma source is presented in this paper. This new microwave plasma source relies on the spatio-temporal control of the electric field inside an all-metal plasma reactor by modifying the waveform of a high power microwave signal. More specifically, it originally used the spatio-temporal focusing capabilities of the time reversal method to focus a high electric field in a small location. However, a parasitic microwave breakdown can still occur at sharp corners or wedges inside the cavity due to the local enhancement of the residual electric field during time reversal focusing. Thus, it is proposed to use the linear combination of configuration field method to improve field control inside the reactor. Its transient electric field shaping capabilities turn out to be a good candidate for the development of a low pressure microwave &#x201C;plasma brush&#x201D;.

Transient Electric Field Shaping With the Linear Combination of Configuration Field Method for Enhanced Spatial Control of Microwave Plasmas