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We report on a temperature-driven reversible change of the in-plane magneticanisotropy of V$_2$O$_3$/Ni bilayers. This is caused by the rhombohedral tomonoclinic structural phase transition of V$_2$O$_3$ at $T_C$ = 160 K. Thein-plane magnetic anisotropy is uniaxial above $T_C$, but as the bilayer iscooled through the structural phase transition, a secondary magnetic easy axisemerges. Ferromagnetic resonance measurements show that this change in magneticanisotropy is reversible with temperature. We identify two structuralproperties of the V$_2$O$_3$/Ni bilayers affecting the in-plane magneticanisotropy: (1) a growth-induced uniaxial magnetic anisotropy associated withstep-like terraces in the bilayer microstructure and (2) a low-temperaturestrain-induced biaxial anisotropy associated with the V$_2$O$_3$ structuralphase transition. Magnetoresistance measurements corroborate the change inmagnetic anisotropy across the structural transition and suggest that thenegative magnetostriction of Ni leads to the emergence of a strain-inducedeasy-axis. This shows that a temperature-dependent structural transition inV$_2$O$_3$ may be used to tune the magnetic anisotropy in an adjacentferromagnetic thin film.

Stress-tailoring magnetic anisotropy of V$_2$O$_3$/Ni bilayers