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We investigate substrate roughness-induced fluctuations on liquid films in the presence of polar (exponential) and apolar (van der Waals) interactions in the complete wetting regime. The liquid/vapor interface roughness amplitude sigma(w) increases rapidly with film thickness epsilon above a critical thickness epsilon(c) for which the film is stable (or it does not rupture due to presence of polar interactions), and it reaches a maximum at a thickness epsilon(m) slightly larger than epsilon(c) if polar and apolar components are of comparable strength and for small polar potential ranges. As the strength of the polar interaction decreases with respect to the apolar; behavior characteristic of that of apolar interactions within the Derjaguin approximation is recovered for moderate film thicknesses (epsilon > epsilon(m)); sigma(w)proportional to zeta(-2) with zeta the healing length. [S1063-651X(99)11701-X].

Roughness-induced fluid interface fluctuations due to polar and apolar interactions