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Well-ordered ultrathin films of NiO have been prepared on an Ag(001)substrate using molecular beam epitaxy. With the help of angle-resolvedtwo-photon photoemission (2PPE) a series of image potential states (IPS) forfilm thicknesses of 2--4 monolayers (ML) has been identified. By time-resolved2PPE, the lifetimes of the first three IPS and their dependence on the oxidefilm thickness have been determined. While the lifetimes of the (n=1) IPS areall in the range of 27--42 fs, the values for the (n=2) IPS decrease from 85 fsfor 2 ML to 33 fs for 4 ML. These differences are discussed in terms of acoupling to the layer-dependent electronic structure of the NiO ultrathinfilms.

Image potential states of ultrathin NiO films: A time-resolved two-photon photoemission study