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We investigate the histograms of conductance values obtained duringcontrolled electromigration thinning of Cu thin films. We focus on the questionwhether the most frequently observed conductance values, apparent as peaks inconductance histograms, can be attributed to the atomic structure of the wire.To this end we calculate the Fourier transform of the conductance histograms.We find all the frequencies matching the highly symmetric crystallographicdirections of fcc-Cu. In addition, there are other frequencies explainable byoxidation and possibly formation of hcp-Cu. With these structures we canexplain all peaks occurring in the Fourier transform within the relevant range.The results remain the same if only a third of the samples are included. Bycomparing our results to the ones available in the literature on work-hardenednanowires we find indications that even at low temperatures of the environment,metallic nanocontacts could show enhanced electromigration at low currentdensities due to defects enhancing electron scattering.

Atomic discreteness and the nature of structural equilibrium in conductance histograms of electromigrated Cu-nanocontacts