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We studied the effect of dopants (Al, Ti, Zr) on the thermal stability ofiron nitride thin films prepared using a dc magnetron sputtering technique.Structure and magnetic characterization of deposited samples reveal that thethermal stability together with soft magnetic properties of iron nitride thinfilms get significantly improved with doping. To understand the observedresults, detailed Fe and N self-diffusion measurements were performed. It wasobserved that N self-diffusion gets suppressed with Al doping whereas Ti or Zrdoping results in somewhat faster N diffusion. On the other hand Feself-diffusion seems to get suppressed with any dopant of which heat of nitrideformation is significantly smaller than that of iron nitride. Importantly, itwas observed that N self-diffusion plays only a trivial role, as compared to Feself-diffusion, in affecting the thermal stability of iron nitride thin films.Based on the obtained results effect of dopants on self-diffusion process isdiscussed.

Effect of dopants on thermal stability and self-diffusion in iron nitride thin films