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a-Nb(x)Si(1-x) thin films with thicknesses down to 25 {\AA} have beenstructurally characterized by TEM (Transmission Electron Microscopy)measurements. As-deposited or annealed films are shown to be continuous andhomogeneous in composition and thickness, up to an annealing temperature of500{\deg}C. We have carried out low temperature transport measurements on thesefilms close to the superconductor-to-insulator transition (SIT), and shown aqualitative difference between the effect of annealing or composition, and areduction of the film thickness on the superconducting properties of a-NbSi.These results question the pertinence of the sheet resistance R_square as therelevant parameter to describe the SIT.

Effect of annealing on the superconducting properties of a-Nb(x)Si(1-x) thin films