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Ion irradiation during film growth has a strong impact on structuralproperties. Linear stability analysis is employed to study surfaceinstabilities during ion-assisted growth of binary alloys. An interplay betweencurvature-dependent ion-driven and deposition-driven instabilities isinvestigated. We demonstrate that ion irradiation of growing binary alloysleads to the formation of composition-modulated surface patterns. It is shownthat the ion-to-atom arrival ratio R is the pattern control parameter. Close tothe instability threshold we identify different regimes of instabilities drivenby ion- or deposition-induced surface roughness processes, orroughness-composition feedback interactions. In particular, the synergisticeffects of the curvature-dependent displacement and deposition coupling to thepreferential sputtering or to the preferential diffusivity are found to induceinstabilities and pattern formation. Depending on the film growth andion-irradiation conditions, the instabilities show stationary or oscillatingbehavior. The latter one is exclusively connected with ion irradiation. Thecorresponding phase diagrams are presented in terms of experimentallyaccessible parameters. This shows an alternative way to control surfacepatterning and to grow three-dimensional laterally or vertically orderednanostructures.

Instability types at ion-assisted alloy deposition: from two-dimensional to three-dimensional nanopattern growth