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This paper investigates faceting mechanisms induced by electromigration inthe regime where atomic steps are transparent. For this purpose we studyseveral vicinal orientations by means of in-situ (optical diffraction,electronic microscopy) as well as ex-situ (AFM, microprofilometry)visualization techniques. The data show that faceting proceeds in two stages.The first stage is short and leads to the appearance of a step density wave,with a wavelength roughly independent of the surface orientation. The secondstage is much slower, and leads to the formation of a hill-and-valleystructure, the period of which depends on the initial surface orientation. Asimple continuum model enables us to point out why the wavelength of the stepdensity wave does not depend on the microscale details of the surface. Thefinal wavelength is controlled by the competition between elastic step-stepinteraction and facet edge energy cost. Finally, the surface stress angulardependence is shown to emerge as a coarsed-grained picture from the step model.

Vicinal silicon surfaces: from step density wave to faceting