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Thin films of iron and permalloy Ni80Fe20 were prepared using an Ar+N2mixture with magnetron sputtering technique at ambient temperature. Thenitrogen partial pressure, during sputtering process was varied in the range of0 to 100%, keeping the total gas flow at constant. At lower nitrogen pressuresRN2<33% both Fe and NiFe, first form a nanocrystalline structure and anincrease in nitrogen partail pressure results in formation of an amorphousstructure. At intermediate nitrogen partial pressures, nitrides of Fe and NiFewere obtained while at even higher nitrogen partial pressures, nitridesthemselves became nanocrystalline or amorphous. The surface, structural andmagnetic properties of the deposited films were studied using x-ray reflectionand diffraction, transmission electron microscopy, polarized neutronreflectivity and using a DC extraction magnetometer. The growth behavior foramorphous film was found different as compared with poly or nanocrystallinefilms. The soft-magnetic properties of FeN were improved on nanocrystallizationwhile those of NiFeN were degraded. A mechanism inducing nanocrystallizationand amorphization in Fe and NiFe due to reactive nitrogen sputtering isdiscussed in the present article.Comment: 13 Pages, 15 Figure

Nanocrystallization and amorphization induced by reactive nitrogen sputtering in iron and permalloy