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The effect of bias voltages on the statistical properties of rough surfaceshas been studied using atomic force microscopy technique and its stochasticanalysis. We have characterized the complexity of the height fluctuation of arough surface by the stochastic parameters such as roughness exponent, levelcrossing, and drift and diffusion coefficients as a function of the appliedbias voltage. It is shown that these statistical as well as microstructuralparameters can also explain the macroscopic property of a surface. Furthermore,the tip convolution effect on the stochastic parameters has been examined.

Controlling surface statistical properties using bias voltage: Atomic force microscopy and stochastic analysis