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limited kinetics, and emphasizes the increased importance of the transient nucleation regime in the latter case, which is due to a combination of delayed nucleation and reduced capture. The consequences of long-range repulsive adsorbate interactions for the form and values of the capture numbers are explored, and the effects of attachment-limited kinetics in relation to low-temperature deposition and annealing experiments are demon- strated. An approximate interpolation scheme between attachment- and diffusion-limited kinetics is proposed, and tested against kinetic Monte Carlo simulations. Using this scheme to interpret recent scanning-tunneling microscopy results on Cu/Cu~111!, lower and upper bounds on the maximum adatom-adatom potential repul- sive energy of 10 and 14 meV are deduced.

Capture numbers in the presence of repulsive adsorbate interactions