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In the continuous search for the capability to control the structure and morphology of newly developed nanostructures, small amounts of adsorbed gases or metals, usually known as surfactants, are currently being used in molecularbeam epitaxy to promote a two-dimensional ~2D! layer-bylayer growth in systems that naturally grow in a threedimensional ~3D!, island mode and where an increase of the deposition temperature would lead to a dissolution of the deposited material into the substrate rather than to an enhancement of surface diffusion. Known for a long time in the field of crystal growth from solutions, 1 the use of surfactants was recently extended to epitaxial growth both in metal 2 and semiconductor systems. 3 Usually, in molecular-beam epitaxy a layer of the surfactant material is deposited on the substrate surface before the actual deposition of the film. With a low surface free energy and a lack of chemical affinity toward the growing materials, the surfactant tends to float during

Surfactant effect of Pb in the growth of Fe on Cu(111): A kinetic effect