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The symmetry-induced magnetic anisotropy due to monoatomic steps at strainedNi films is determined using results of first - principles relativisticfull-potential linearized augmented plane wave (FLAPW) calculations and ananalogy with the N\'eel model. We show that there is a magnetoelasticanisotropy contribution to the uniaxial magnetic anisotropy energy in thevicinal plane of a stepped surface. In addition to the known spin-directionreorientation transition at a flat Ni/Cu(001) surface, we propose aspin-direction reorientation transition in the vicinal plane for a steppedNi/Cu surface due to the magnetoelastic anisotropy. We show that with anincrease of Ni film thickness, the magnetization in the vicinal plane turnsperpendicular to the step edge at a critical thickness calculated to be in therange of 16-24 Ni layers for the Ni/Cu(1,1,13) stepped surface.Comment: Accepted for publication in Phys. Rev.

Magnetoelastic mechanism of spin-reorientation transitions at step edges