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Microbunching instability is a well-known phenomenon that may deteriorate the performance of accelerators. The instability may be triggered by a shot-noise mechanism or by some initial intensity modulations at the generation of the electron bunch (or both) and can be amplified all along the machine. At SwissFEL, the free-electron laser (FEL) facility operating at the Paul Scherrer Institute (PSI), the initial design stipulated a shaping of the photocathode laser output to obtain a flat-top longitudinal profile. This scheme is attractive in terms of the uniformity of the beam properties along the bunch. The drawback of this approach is that some unavoidable modulations are generated along the laser pulse. We investigate, both experimentally and by numerical simulations, the longitudinal dynamics of a beam obtained illuminating a copper cathode with a laser profile shaped by the stacking technique. We repeat the analysis for several compression factors and initial laser profile modulations. We find that the microbunching instability gain renders the use of the stacking technique not efficient to run a free-electron laser facility using as photocathode a material with a short response time. We experimentally demonstrate that the use of a material with a longer response time efficiently damps the structures originating from the laser profile obtained with stacking, and helps to improve the performance of the facility. In general, this is an approach to minimize the microbunching instability at any FEL (also not using stacking) or at least reduce the use of other countermeasures, which, such as the laser heater, may degrade the final FEL performance.

Impact of laser stacking and photocathode materials on microbunching stability in photoinjectors