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The Casimir free energy and pressure of thin metal films deposited onmetallic plates are considered using the Lifshitz theory and the Drude andplasma model approaches to the role of conduction electrons. The boundelectrons are taken into account by using the complete optical data of film andplate metals. It is shown that for films of several tens of nanometersthickness the Casimir free energy and pressure calculated using theseapproaches differ by hundreds and thousands percent and can be easilydiscriminated experimentally. According to our results, the free energy of ametal film does not vanish in the limiting case of ideal metal if the Drudemodel approach is used in contradiction with the fact that the fluctuatingfield cannot penetrate in its interior. Numerical computations of the Casimirfree energy and pressure of Ag and Au films deposited on Cu and Al plates havebeen performed using both theoretical approaches. It is shown that the freeenergy of a film can be both negative and positive depending on the metalsused. For a Au film on a Ag plate and vice versa the Casimir energy of a filmchanges its sign with increasing film thickness. Applications of the obtainedresults for resolving the Casimir puzzle and the problem of stability of thinfilms are discussed.

Characteristic properties of the Casimir free energy for metal films deposited on metallic plates