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We consider the effect of atomic hydrogen exposure to a system of two undopedsheets of graphene grown near a silica surface (the first adsorbed to thesurface and the second freestanding near the surface). In the absence of atomichydrogen the van der Waals force between the sheets is attractive at allseparations causing the sheets to come closer together. However, with additionof atomic hydrogen between the sheets the long range van der Waals interactionturns repulsive at a critical concentration. The underlying triple layerstructure (SiO2 -Atomic Hydrogen Gas -Air) gives rise to a long range repulsionthat at large enough separations dominates over the more rapidly decayingattraction between the two-dimensional undoped graphene sheets (and between theouter graphene sheet and SiO2). This may be an avenue to tune the separationbetween two graphene sheets with the gas concentration. Doping of the graphenelayers increases the attractive part of the interaction and hence reduces thenet repulsive interaction.

Repulsive van der Waals forces due to hydrogen exposure on bilayer Graphene