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In this work, the influence of bias voltage on the structure, composition and physical properties of TiCrN-Mo 2 N-Ni arc Physical Vapor Deposition (arc-PVD) coatings were studied. Multilayer structure formed at all applied bias voltage due to planetary rotation of substrates. Thickness of sublayers range from 1 to 32 nm and defined by the plasma flow intensity from evaporators. Monte-Carlo calculation was used to study structure of prepared coatings. According to calculation and analysis of TEM images, sublayers composed by nitrides mixture. All coating characterized by high hardness, which correlated with residual stress of coatings.

Influence of bias voltage on structure and mechanical properties of TiCrN-Mo2N-Ni coatings